Mask Solution Application Engineer

Key Skills

Analytical and Problem solving, Deep Learning, Effective communication skills, Linux Operating system, Machine learning techniques, MATLAB Programming, Perl Programming, Planning and organization, Python Programming

Job Description

As Applications Engineer for Mask Synthesis, you will be the primary technical contact for customers, supporting Proteus OPC & ILT, RET lithography proximity correction and resolution enhancement tool.

The simulator covers a wide range of applications in optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography, allowing for precise patterning & process margin maximization and 

thorough analysis of overall optical & process proximity effects.

Further, as the product expert you will work with PE, R&D in Europe/US, sales, and our customers to help drive the development and acceptance of our products. 

Duties include both pre-sales and post-sales activities such as technical support of the product, testing, example creation, benchmarking, technical training, and onsite evaluation support.

At customers and within Synopsys departments the candidate will also interface and support various engineers for mask synthesis working on Lithography Modeling or Lithography Verification.

Minimum Requirements

The candidate holds an advanced degree (Master or PhD) in Physics, Computer Science, Chemistry, Material Science, or Electrical Engineering.

Hands-on in computer skills, including Windows, Linux, scripting (e.g. TCL, Python, Perl) and programming skills. Experience with MATLAB or Machine Learning & Deep Learning is an advantage.

Excellent communication and organizational skills are required to handle customer projects proactively and support request efficiently.

Strong desire and ability to work on new topics to overcome future lithographic challenges in semiconductor industry.

Successful candidate has high self-motivation and can work independently without day-to-day supervision.

Strong networking tasks with internal teams or external customers or cross functional projects demand good verbal and written English skills.

Excellent problem-solving skills.

Preferred Requirements

The position requires at least 3+ year's experiences with advanced patterning and/or mask fabrication techniques as well as a good background in general semiconductor manufacturing technology.

Knowledge of lithography Mask synthesis (OPC, RET & LRC) and/or Lithography simulation is desired.

Experience with photolithography theory including optics, mask or wafer topographic EMF modeling or resist modeling is a strong advantage.